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Sku 73-0723-250MG
STREM
| Technical Note: 1. Useful precursor for the atomic layer deposition of tantalum oxide and tantalum nitride. References: 1.Journal of Nanosci. and Nanotechno., 2013, 13, 4097. 2.Semicond. Sci. Tech., 2012, 27, 074003/1. 3.Chem. Vapor Depos., 2011, 17, 37. I 4.Electrochem. Solid St., 2010, 13, H426. 5. J. Electrochem. Soc., 2010, 157, H652. 6.J.Electrochem. Soc., 2009, 156, H852. |
