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Sku 42-1350-25G
STREM
| Technical Notes: 1.AL .D precursor used for Mo thin film deposition References: 1.Chem. Vap. Deposition 2001 Z 33. 2.ACs App/. Mater. Interfaces 2019 11 173211 3.Chem. Mater. 2019. 31. 8338. 4.J. Mater. C hem.. 2011 21 705. 5.J. Electron. Mater.. 2018. 4Z. 6709. 6.Nanoscale.2014. 6. 14453. 7.L angmuir2015. 31.1196 8.App/. Surf. Sci.. 2016 365. 1 60. 9.Phys. Status Solidi RRL 2018 12 1 800023. 10. J. Vac. Sci. Technol. A. 2020. 38. 022409. |
