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Sku 31-2030-25G
STREM
| Technical Notes: 1. AL D/CVD precursor for gallium thin film deposition References: 1. Polyhedron 1990, 9, 257 2. J. Vac. Sci. Technol. A, 1996, 14, 306 3. Chem. Mater. 2006, 18, 471 4.ECS Trans. 2009, 25, 617 5.Dalton Trans.. 2017, 46, 16551 6.J. Mater. Chem.. 2007, 17, 1308 7.J Vac. Sci. Technol. A, 2019, 37, 030906 8.ACS Appl. Energy Mater. 2020, 3, 7208 9.Chem. Mater. 2014., 26, 1 029 10. Mater. Today hem. 2018, 10, 142 11. J Mater. Chem. C, 2020, 8. 8457 |
